Objective lenses for mask / wafer inspection

マスク・ウェハ検査用対物レンズ

Wide field of view・Long working distance and Aberration-free

The MI series of objective lenses for mask / wafer inspection have co-functioning with a wide field of view, long working distance and aberration-free, and are suitable for semiconductor photomask / wafer inspection.
Customized support for interface section and various relay lenses is available.

Key features

Features
  • From its refractive optical system, it has no shielding , but long working distance.
  • It is achromatic within the spectrum of the laser, resulting in good imaging properties.
  • The design performance is numerically guaranteed by measuring wavefront aberration with an interferometer.
  • Suitable for semiconductor mask / wafer observation applications.
Applications
  • Semiconductor wafer inspection equipment
  • Semiconductor mask inspection equipment
Sample for an evaluation of transmitted wavefront aberration (MI266-5085)
Sample for an evaluation of transmitted wavefront aberration (MI266-5085)

Specification examples

Model No. MI193-5085 MI266-5085 MI355-5085
Wavelength 193.4nm 266nm 355nm
Bandwidth
(full width at half maximum)
8pm 5pm 20pm
Type Refractive type
Numerical aperture (NA) 0.85
Focal length 5mm
Transmittance ≥ 70% ≥ 80%
Field of view Φ0.3mm Φ0.45mm
Wavefront aberration
(monochromatic)
≤ 0.03 waves rms
Working distance ≥ 8mm
Weight Approx. 6.5kg Approx. 7.1kg Approx. 7kg
Operating temperature 23±0.5℃

Dimensions

MI193
MI193
MI-266/355
MI-266/355

Catalog Download

Objective lenses for mask / wafer inspection (pdf, 674KB)